Self-organizing di-block copolymer thin films provide a low-cost, efficient means to engineer nanometer-scale structures over large wafer areas. We have developed a broad set of fabrication processes based on these polymer templates, including pattern transfer by reactive-ion etching, chemical etching, and metal deposition. We believe this technique can be used quite generally as a high-resolution patterning step in the fabrication of more complicated device structures. We are currently investigating possibilities for the diblock copolymer patterning process in semiconductor devices, spin-dependent electronic devices, magnetic media, and biology.
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